Reaction cell for species sensing
Inventors
Zafar, Abdullah • Chan, Kelvin • Kraus, Philip Allan
Assignees
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Publication Number
US-12406837-B2
Publication Date
2025-09-02
Expiration Date
Abstract
Embodiments disclosed herein include semiconductor processing tools. In an embodiment, the semiconductor processing tool comprises a plasma source, and a chamber coupled to the plasma source. In an embodiment, a pump is coupled to the chamber. In an embodiment, the semiconductor processing tool further comprises a sampling line. In an embodiment, the sampling line comprises a reaction chamber, and an absorption chamber.
Core Innovation
The invention relates to semiconductor plasma processing tools that use laser absorption spectroscopy to quantify species in relation to plasma generation and to support closed-loop control. A plasma source generates radicals, which are sampled through a sampling line that includes a reaction chamber and an absorption chamber.
In the reaction chamber, radicals react with a first species to form a second species, and the second species is measured in an absorption chamber, where the measurement corresponds to the radicals. The absorption chamber includes optical window arrangements with a light source and a light detector configured for measuring the second species.
In a further described configuration, the semiconductor processing tool uses a remote plasma source and fluidly couples the chamber to the remote plasma source. The sampling line is fluidically in parallel with the chamber and includes the reaction chamber and absorption chamber.
Claims Coverage
The partial content provides three independent claims: clm-00001, clm-00013, and clm-00017. Together they define the core sampling-line architecture and the measurement correspondence between second-species absorption and radical concentration.
Semiconductor processing tool with plasma source and sampling line including reaction and absorption chambers
A semiconductor processing tool includes a plasma source; a chamber coupled to the plasma source; a pump coupled to the chamber; and a sampling line, wherein the sampling line comprises a reaction chamber and an absorption chamber.
Method of determining radical concentration via reaction to second species and absorption measurement
A method of determining a radical concentration comprises generating radicals with a plasma source; diverting a sample of the radicals down a sampling line; reacting the radicals with a first species to form a second species in a reaction chamber of the sampling line; and measuring the second species in an absorption chamber of the sampling line, wherein a measurement of the second species corresponds to a measurement of the radicals.
Semiconductor processing tool with remote plasma source and parallel sampling line including reaction and absorption chambers
A semiconductor processing tool comprises a remote plasma source; a chamber fluidically coupled to the remote plasma source; a pump fluidically coupled to the chamber; and a sampling line that is fluidically in parallel with the chamber, wherein the sampling line comprises a reaction chamber and an absorption chamber.
Across the independent claims, the core coverage centers on a semiconductor processing tool architecture where a sampling line includes a reaction chamber and an absorption chamber, diverting radicals through the sampling line and reacting them with a first species to form a second species, and measuring the second species in the absorption chamber so that the measurement corresponds to radical concentration, including an embodiment using a remote plasma source with a parallel sampling line.
Stated Advantages
Not explicitly described in patent.
Documented Applications
Not explicitly described in patent.
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