Catheter system with independently controllable bubble and arc generation
Inventors
Assignees
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Publication Number
US-12220141-B2
Publication Date
2025-02-11
Expiration Date
Abstract
Described herein are systems and methods for implementing a power source for a shock wave catheter system, the power source including two separate voltage sources: a bubble generation voltage source and an arc generation voltage source. In one or more examples, the power source can be configured such that the bubble generation voltage source provides a lower voltage to a pair of electrodes of the shock wave catheter system. The lower voltage can be configured to induce electrolysis of a fluid that surrounds the pair of electrodes of the shock wave catheter system for generating and growing a bubble. Once a bubble has formed, the arc generation voltage source can then be engaged to provide a high-voltage electrical pulse to the electrodes of the shock wave catheter system, thereby generating an arc (i.e., spark) across the electrodes.
Core Innovation
The disclosure relates to shock wave catheter systems for generating shock waves by applying separately controllable voltages to one or more electrodes. A first voltage is applied using a first voltage source to prime an aqueous environment or generate one or more bubbles in a fluid surrounding the electrodes, and a second voltage is then applied using a second voltage source to the electrodes to generate an electrical arc at the electrodes, producing shock waves.
The first and second voltage sources are independently controllable, and the disclosure includes electrical separation to prevent interaction between the voltage sources. Mode sequencing is used such that operation in a bubble generation mode is longer than operation in an arc generation mode. Transition between modes is based on feedback and threshold criteria, including bubble formed determination and threshold current criteria for arc generation mode.
In addition to shock wave generation, the disclosure includes electrode protection via backplating. A third voltage is applied to the electrodes to cause metal to be deposited, where the applied third voltage is less than the applied first voltage. The disclosure further describes backplating-compatible fluid mixtures and operating modes for bubble, arc, charge, and backplating.
Claims Coverage
Independent claim clm-00001 defines the core method, with independent inventive coverage centered on two features and a separate backplating feature. The provided claim excerpts further refine sequencing, thresholds, and quantitative constraints.
Independently controllable first and second voltage sources for shock wave generation
Applying a first voltage, using a first voltage source, to one or more electrodes to prime an aqueous environment or generate one or more bubbles in a fluid surrounding the electrodes; and applying a second voltage, using a second voltage source, to the electrodes to generate an electrical arc at the electrodes; wherein the first voltage source and the second voltage source are independently controllable.
Third voltage for metal deposition with lower voltage relationship
Applying a third voltage to the one or more electrodes to cause metal to be deposited on the one or more electrodes, wherein the applied third voltage is less than the applied first voltage.
The primary inventive features are independent control of a bubble-priming voltage and an arc-generating voltage, followed by a separate lower third voltage that causes metal deposition on the electrodes for electrode protection.
Stated Advantages
Not explicitly described in patent.
Documented Applications
Not explicitly described in patent.
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