Apparatus and method for detecting trace metals with electrically conductive diamond electrodes
Inventors
Becker, Michael Frank • Schuelke, Thomas
Assignees
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Publication Number
US-12061162-B2
Publication Date
2024-08-13
Expiration Date
Abstract
A trace metal analysis detector and method of operating the same to detect metals in various fluid samples using boron doped diamond working electrodes.
Core Innovation
The invention provides a method of forming a boron doped diamond electrode that includes depositing a boron doped diamond material on a substrate, adding an insulative material over the boron doped diamond material, and growing additional boron doped diamond material on an exposed portion of the boron doped diamond material. The insulative material controls which portions remain exposed for further growth, so boron doped diamond is grown selectively on an exposed portion while other regions are masked by the insulative material.
The invention further includes options for handling the insulative material to achieve the selective growth behavior. In some embodiments the insulative material is eroded away before the growing step, while in other embodiments the insulative material is treated to prevent growth of diamond material before the growing step. The insulative material can be treated by selecting at least one of hydrogen plasma treatment, acid washing, or ensuring a scratch-free insulative surface, and the insulative material can also be eroded away after the growing step.
The invention also provides a trace-metal analysis approach that uses electroplating and reverse potential scanning to detect trace metals in a fluid sample. The method applies a first predetermined electroplating potential to electroplate a first metal of interest to a working electrode and then runs a reverse scan to release the first metal from the working electrode to quantify the amount of the first metal.
Additional trace metals are quantified by applying a second predetermined electroplating potential that is more negative than the first to electroplate the first metal and a second metal together, running a reverse scan to quantify the first metal and the second metal together, and repeating the applying and reverse-scan sequence for each additional desired metal.
Claims Coverage
The consolidated content includes two independent claims. The inventive features cover selective formation of a boron doped diamond electrode using an insulative material, and trace-metal detection using predetermined electroplating potentials and reverse scans, repeated for additional metals and implemented using a chip having multiple analysis chambers with pumping between chambers.
Selective boron doped diamond growth using insulative masking
Depositing a boron doped diamond material on a substrate; adding an insulative material over the boron doped diamond material; and growing additional boron doped diamond material on an exposed portion of the boron doped diamond material.
Sequential and co-electroplating trace-metal detection with reverse scans in a multi-chamber chip
Applying a first predetermined electroplating potential to electroplate a first metal of interest to a working electrode; running a reverse scan to release the first metal from the working electrode to quantify the amount of the first metal; applying a second predetermined electroplating potential, which is more negative than the first electroplating potential, to electroplate the first metal and a second metal together on the working electrode; running a reverse scan on the working electrode to a positive potential to quantify the first metal and the second metal together; repeating these steps for each additional desired metal; and using a chip with a plurality of analysis chambers including pumping the fluid sample from one analysis chamber to a new chamber including a working electrode before each applying step.
The claims combine selective boron doped diamond electrode formation with trace-metal detection in a fluid sample using electroplating at predetermined potentials and reverse scans, repeated for additional metals and implemented in a chip having multiple analysis chambers with pumping between chambers.
Stated Advantages
Wide potential window.
Low stable background.
Repeatability and stability.
Environmental friendliness.
Detecting trace-metal amounts down to parts-per-trillion.
Documented Applications
Trace-metal detection in a fluid sample using a chip with a plurality of analysis chambers, including pumping between chambers to perform electroplating and reverse scans for quantifying multiple metals.
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