Method and apparatus for electron beam processing control
Inventors
Badali, Daniel Salvatore • Funk, Tobias
Assignees
Publication Number
US-11947878-B2
Publication Date
2024-04-02
Expiration Date
2040-11-24
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Abstract
A digital representation of an object is formed. The properties of incident electrons are calculated from a parameterized source model and the irradiation of the object is simulated. The particle-matter interactions for a material of the object are calculated. The amount of absorbed dose at locations at the object is calculated. The digital representation of the object is modified in response to an input from a user and the modified digital representation of the object is displayed.
Core Innovation
The invention provides a method and apparatus for electron beam processing control, focusing on accurate calculation of the three-dimensional dose distribution absorbed by an object during electron beam processing. A digital representation of an object is generated, where the object is divided into volume elements, allowing for simulation of irradiation and analysis of the absorbed dose in each element. The system uses computer simulations to model electron-matter interactions, tallying the dose absorbed by each volume element, and presenting this as a three-dimensional distribution.
The properties of incident electrons are calculated using a parameterized source model. This allows users to simulate energy, direction, and position for each electron in accordance with the characteristics of typical electron beam sources. By comparing simulated and measured doses on structures of known material, the parameters of the source model can be calibrated, thereby validating simulation accuracy.
A graphical user interface is included to facilitate user interaction, configuration, and visualization of the simulation process. The system supports modifying the digital representation of the object in response to user input and displaying both the modified representation and the resulting three-dimensional dose distribution. This approach overcomes the limitations of conventional dosimeter-based measurement, particularly for complex or restricted geometries, and enables comprehensive investigation and control of electron beam processing applications.
Claims Coverage
The patent includes several independent claims covering computer-implemented methods and systems for controlling electron beam processing using parameterized source models, digital object representations, simulation of dose deposition, and analysis tools.
Computer-implemented method for processing control using parameterized source model and dose simulation
This feature involves: - Accessing a parameterized model of the electron beam source. - Generating a digital representation of a physical object composed of a plurality of volume elements. - Simulating incident electrons at the object's surface using the source model. - Calculating the total energy deposited in each volume element due to interactions with the object material. - Determining the absorbed dose in each volume element based on deposited energy. - Displaying a three-dimensional distribution of absorbed dose in the object. - Comparing absorbed dose in each volume element against a threshold required for sterilization. - Calculating values of the parameters of the parameterized source model based on comparison results.
Computer-implemented method for processing control with threshold to avoid material damage
This feature includes: - Accessing a parameterized model of an electron beam source. - Generating a digital representation of a physical object with volume elements. - Simulating incident electrons on the object's surface using the source model. - Calculating energy deposited per volume element from interactions with object material. - Determining absorbed dose per element. - Displaying three-dimensional absorbed dose distribution. - Comparing absorbed dose to a dose threshold required to avoid damaging the material. - Calculating values of source model parameters based on this comparison.
System for processing control of electron beam including simulation, comparison, and visualization
This feature comprises: - A system with memory storing the digital object representation, input and display devices, and a processor. - Executable components to access a parameterized source model, generate digital object representation, and simulate incident electrons using the source model. - Calculation of energy deposition in object volume elements from electron interactions. - Determination of absorbed dose in each volume element. - Display of three-dimensional absorbed dose distribution. - Comparison of absorbed dose against a dose threshold for crosslinking the material. - Calculation of parameter values for the source model based on the dose comparison.
The independent claims cover methods and systems for digitally modeling and controlling electron beam processing by simulating three-dimensional dose distributions, conducting parameterized modeling of electron sources, visualizing and comparing dose outcomes, and adjusting source parameters based on these comparisons.
Stated Advantages
The invention overcomes the limited ability of dosimeters to characterize three-dimensional dose distributions by providing an alternative method to analyze dose absorbed by an object during electron beam processing.
The simulation-based method allows calculation of the dose distribution without incurring the resources to construct a physical object.
Access to three-dimensional dose distribution offers insights into the effectiveness of electron beam processing applications that would not otherwise be available.
The invention enables determination if required dose uniformity is met for applications like crosslinking or if sufficient dose is delivered for sterilization.
Documented Applications
Sterilization of single-use medical devices and healthcare products by electron beam irradiation.
Irradiation of food to eliminate food-borne pathogens and extend shelf life; used in the agriculture industry for sterilizing animal feed, growth media, planting pots, and disinfecting beehives.
Modification of material properties, such as inducing chain scission and crosslinking in polymer-based materials, and used for curing and grafting.
Enhancement and modification of colors of precious gemstones via electron beam irradiation.
Aging studies for electronic components required for long lifetimes in radiation-exposed environments, including space, aviation, and nuclear medicine.
Tailoring the switching speeds of silicon-based power semiconductor devices using electron beam irradiation.
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