Method for optimizing treatment of infected metallic implants by measuring charge transfer
Inventors
Canty, Mary K. • Hobble, Jackson G.
Assignees
Interested in licensing this patent?
MTEC can help explore whether this patent might be available for licensing for your application.
Publication Number
US-11937926-B2
Publication Date
2024-03-26
Expiration Date
Abstract
A method and related system for treating a metallic surface in order to eradicate bacteria on the metallic surface using at least three electrodes and in which the metallic surface is one of the electrodes and in which a stimulation voltage is applied to the metallic surface and an accumulated charge is measured. The accumulated charge is compared to a threshold level wherein the stimulation voltage is maintained until the accumulated charge exceeds the threshold level. In at least one version, the metallic surface is that of a surgical implant.
Core Innovation
The invention relates to a method for treating a metallic surface of an implantable device to eradicate infectious bacteria. A stimulation device of a treatment system applies a DC voltage sufficient to disrupt the bacteria from the metallic surface, with the DC voltage applied between a pair of electrodes and one electrode being the implantable device. The treatment uses a processor to measure an accumulated charge transfer to the metallic surface over time, measured in coulombs.
The processor compares the measured accumulated charge transfer to a predetermined charge transfer threshold level stored by the processor. Treatment is continued by applying the DC voltage until the measured accumulated charge transfer exceeds the predetermined charge transfer threshold level. Accumulated charge transfer is treated as a control basis rather than relying on only a fixed application duration.
An associated system is provided for treating an infected metallic implant. The system includes a working electrode coupled to the device, where the working electrode is the metallic implant, and includes a counter electrode and a reference electrode coupled to the device to form an electrochemical circuit with the working electrode. A processor measures accumulated charge transfer in coulombs over time to control the duration of treatment by comparing the accumulated charge transfer to the predetermined charge transfer threshold level and terminating treatment when the threshold is met or exceeded.
Claims Coverage
Two independent claims are present: a method claim and a system claim. Across these claims, the inventive focus is on controlling DC voltage treatment using accumulated charge transfer measured in coulombs compared to a predetermined charge transfer threshold level, including defining electrode roles for an electrochemical circuit in the system claim.
Disrupting infectious bacteria from a metallic implant surface using DC voltage controlled by accumulated charge transfer threshold
Applying a DC voltage sufficient to disrupt infectious bacteria from a metallic surface of an implantable device, with the DC voltage applied between a pair of electrodes and one electrode being the implantable device; measuring accumulated charge transfer to the metallic surface over time in coulombs; comparing the measured accumulated charge transfer to a predetermined charge transfer threshold level stored by the processor; and continuing to apply the DC voltage until the measured accumulated charge transfer exceeds the predetermined charge transfer threshold level.
Electrochemical circuit treatment of an infected metallic implant terminated by accumulated charge transfer threshold comparison
Providing a system with a device capable of applying a stimulation DC voltage capable of disrupting bacteria; a working electrode coupled to the device where the working electrode is the metallic implant; a counter electrode; a reference electrode, with both the counter electrode and reference electrode coupled to the device to form an electrochemical circuit with the working electrode; and a processor programmed to measure accumulated charge transfer to the metallic implant over time in order to control the duration of treatment, comparing the accumulated charge transfer measured in coulombs to a predetermined charge transfer threshold level stored by the processor and terminating treatment when the accumulated charge transfer meets or exceeds the predetermined charge transfer threshold level.
The method and system claims share the same core control concept: DC stimulation for disrupting infectious bacteria on a metallic implant surface is governed by measuring accumulated charge transfer in coulombs and terminating treatment when that accumulated charge transfer exceeds or meets or exceeds a predetermined charge transfer threshold level. The system claim additionally defines an electrochemical circuit using a working electrode as the implant together with counter and reference electrodes coupled to the device.
Stated Advantages
Not explicitly described in patent.
Documented Applications
Not explicitly described in patent.
Interested in licensing this patent?