Methods, processes, and apparatus for depositing nanosensors on low surface energy substrates
Inventors
VARADAN, VIJAY • Rai, Pratyush • Mathur, Gyanesh
Assignees
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Publication Number
US-11619606-B2
Publication Date
2023-04-04
Expiration Date
Abstract
A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.
Core Innovation
The disclosed invention provides a method for depositing nanosensors on a low energy substrate by addressing substrate surface energy and adhesion. A plasma stream is directed onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, followed by applying an adhesive layer to the plasma discharge treated substrate.
Nanosensors are then deposited on the adhesive coated substrate via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors. This emphasizes forming vertically standing nanosensors using the electrostatic force assisted deposition step in combination with the increased surface energy and the adhesive layer.
The document also describes an AFM probe used to measure surface energy using a force map to track change of surface energy during nanosensor deposition. An apparatus concept is described that includes plasma jet surface-energy treatment with real-time AFM-based force mapping feedback, and downstream stations including a screen printing station for adhesive and a flocking station for electrostatic fiber deposition.
Claims Coverage
The only independent claim identified in the provided content is clm-00001. It covers a three-part deposition sequence (plasma surface-energy increase, adhesive layer application, and electrostatic force assisted deposition) combined with AFM force-map monitoring of surface-energy change during deposition.
Plasma-treated low energy substrate to target surface-energy range
Directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m.
Adhesive layer on plasma discharge treated substrate
Applying an adhesive layer to the plasma discharge treated substrate of step (a).
Electrostatic force assisted deposition to form vertically standing nanosensors
Depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.
AFM force-map tracking of surface energy during deposition
Using an AFM probe to measure surface energy using a force map to track change of surface energy during the nanosensor deposition.
Across the identified independent claim, the inventive combination is plasma stream surface-energy increase to a defined range, application of an adhesive layer, electrostatic force assisted deposition under a defined high electrostatic field to form vertically standing nanosensors, and AFM force-map measurement used to track surface-energy change during nanosensor deposition.
Stated Advantages
Not explicitly described in patent.
Documented Applications
Not explicitly described in patent.
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