Methods, processes, and apparatus for depositing nanosensors on low surface energy substrates
Inventors
VARADAN, VIJAY • Rai, Pratyush • Mathur, Gyanesh
Assignees
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Publication Number
US-11041825-B2
Publication Date
2021-06-22
Expiration Date
Abstract
A system and method is provided for depositing nanosensors including directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m, applying an adhesive layer to the plasma discharge treated substrate; and depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.
Core Innovation
The invention provides a method for depositing nanosensors on a low energy substrate by directing a plasma stream onto a low energy substrate to increase its surface energy. The treated substrate is increased to a surface energy from 44 mN/m to 80 mN/m, starting from a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m.
After the plasma discharge treated substrate is formed, an adhesive layer is applied to the plasma discharge treated substrate. The adhesive coated substrate is then used for depositing nanosensors via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm.
The electrostatic force assisted deposition forms vertically standing nanosensors. In step (a), the plasma stream is created by applying voltage between a working electrode and a counter electrode, and the method further comprises heating a platform containing the low surface energy substrate and measuring a surface energy of the low energy substrate.
Claims Coverage
The document includes one independent claim (a method) and its main inventive features revolve around plasma jet surface activation of a low energy substrate to a specified surface energy range, adhesive coating of the treated substrate, and electrostatic force assisted deposition of nanosensors using a specified strong electrostatic field to form vertically standing nanosensors; the method also includes heating, measuring surface energy, and generating the plasma stream using a working electrode and a counter electrode.
Plasma stream activation of a low energy substrate to a higher surface energy range
Directing a plasma stream onto a low energy substrate having a surface energy of from 10 mN/m to 43 mN/m to increase the surface energy of the substrate to from 44 mN/m to 80 mN/m.
Adhesive layer on the plasma discharge treated substrate
Applying an adhesive layer to the plasma discharge treated substrate of step (a).
Electrostatic force assisted deposition forming vertically standing nanosensors
Depositing nanosensors on the adhesive coated substrate of step (b) via electrostatic force assisted deposition using a high strength electrostatic field of from 2 kV/cm to 10 kV/cm to form vertically standing nanosensors.
Plasma generation with electrode voltage and platform heating with surface energy measurement
In step (a), creating the plasma stream by applying voltage between a working electrode and a counter electrode, and further comprising heating a platform containing the low surface energy substrate, and measuring a surface energy of the low energy substrate.
Overall, the independent claim coverage centers on converting low-surface-energy substrates into a higher surface energy range using a plasma stream, coupling that activation to an adhesive layer, and then using electrostatic force assisted deposition in a strong electric field to form vertically standing nanosensors, with plasma generation defined by electrode voltage and with heating and surface energy measurement included for step (a).
Stated Advantages
Documented Applications
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