Process gas management system and photoionization detector
Inventors
Vollero, Michael F. • Briglin, Shawn M.
Assignees
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Publication Number
US-10047437-B2
Publication Date
2018-08-14
Expiration Date
Abstract
Systems for a managing a chemical process and photoionization detectors for analyzing a process gas are presented. In one aspect, the system includes a process gas source in fluid communication with the process chamber and a photoionization detector. The photoionization detector is configured to analyze the process gas. The photoionization detector includes a heat resistant coupling for connection to the system, a gas sample chamber with the radiation window soldered or brazed to a wall of the gas sample chamber, and a radiation source configured to emit radiation through the radiation window and into the gas sample chamber to analyze the process gas. In another aspect, the photoionization detector includes a removable coupling, a gas sample chamber, and a radiation source. The removable coupling is for connection to the process gas handling system and includes a metal gasket and metal flanges.
Core Innovation
The disclosed invention provides a system for managing a chemical process by analyzing a process gas with a photoionization detector. The system includes a process gas source in fluid communication with a process chamber, and the photoionization detector is configured to analyze the process gas. The detector includes a removable heat resistant coupling for connection to the process gas source and a gas sample chamber connected to the source using the removable coupling to provide a leak-tight gas connection.
A radiation window is soldered or brazed to a wall of the gas sample chamber, and a radiation source is configured to emit radiation through the radiation window and into the gas sample chamber to analyze the process gas. The removable coupling and the radiation window are arranged to maintain a leak-tight gas connection between the process gas source and the gas sample chamber. In dependent aspects, the detector measures partial pressure of a selected gas species from a gas mixture, and a collector may be included to measure sample gas current.
For a deposition process, the invention combines the photoionization detector with a process gas source that includes a heated precursor and a source of a carrier gas, where the process gas comprises the carrier gas and a precursor gas species. The deposition chamber is in fluid communication with the process gas source, and the photoionization detector is used to determine a partial pressure of the precursor gas species by emitting radiation through the radiation window into the gas sample chamber. The removable heat resistant coupling is configured to operate at temperatures above 300° C.
Claims Coverage
The document contains three independent claims. They collectively cover a photoionization detector with a removable heat resistant coupling and a radiation window, the detector structure itself with a leak-tight gas connection, and a deposition-process system that uses the detector to determine partial pressure of a precursor gas species.
Photoionization detector with removable heat resistant coupling and brazed or soldered radiation window
A photoionization detector configured to analyze a process gas, comprising a removable heat resistant coupling for connection to a source of the process gas; a gas sample chamber with a radiation window soldered or brazed to a wall of the gas sample chamber, wherein the removable coupling provides a leak-tight gas connection between the source of the process gas and the gas sample chamber; and a radiation source configured to emit radiation through the radiation window and into the gas sample chamber to analyze the process gas.
Removable coupling with metal gasket and metal flanges
A photoionization detector configured to analyze a process gas, comprising a removable coupling for connection to a source of the process gas, the removable coupling comprising a metal gasket and metal flanges, wherein the metal gasket and the metal flanges provide a leak-tight gas connection between the source of the process gas and the gas sample chamber.
Deposition process system using photoionization detector to determine precursor gas species partial pressure
A system for managing a deposition process including analyzing a process gas, comprising a process gas source comprising a heated precursor and a source of a carrier gas, wherein the process gas comprises the carrier gas and a precursor gas species; a deposition chamber in fluid communication with the process gas source; and a photoionization detector configured to analyze the process gas and determine a partial pressure of the precursor gas species.
Across the independent claims, inventive coverage centers on photoionization-based gas analysis using a radiation window soldered or brazed to a gas sample chamber and a removable heat resistant coupling that provides a leak-tight connection to the process gas source. The independent detector claim further specifies the coupling as including a metal gasket and metal flanges, and the deposition-process system claim ties the detector's use to determining partial pressure of a precursor gas species.
Stated Advantages
Allows operation at temperatures above 300° C. for the removable heat resistant coupling.
Provides a leak-tight gas connection between the source of the process gas and the gas sample chamber.
Enables determining partial pressure of a precursor gas species and analyzing a process gas using radiation through the radiation window.
Documented Applications
Monitoring and managing a chemical process by analyzing a process gas with a photoionization detector.
Managing a deposition process by analyzing a process gas to determine partial pressure of a precursor gas species in a deposition chamber.
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